Positive bias temperature instability of SiC-MOSFETs induced by gate-switching operation
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Threshold voltage instabilities of present SiC-power MOSFETs under positive bias temperature stress
We study the threshold voltage (Vth) instability of commercially available silicon carbide (SiC) power MOSFETs or prototypes from four different manufacturers under positive bias temperature stress (PBTS). A positive bias near Vth causes a threshold voltage shift of 0.7 mV per decade in time per nanometer oxide thickness in the temperature range between -50°C and 150°C. Recovery at +5 V after a...
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